Исследование ионно-электронной эмиссии пленок Cs на гранах (110) и (111) монокристаллов молибдена

Abstract

During the formation of a monatomic layer, the work function of the surface mainly changes, and the values ​​of n_B and Ԑ_F practically remain constant. Under these conditions, the PEE parameters are determined mainly by changes in the work function of the surface. When moving to a film of sufficient thickness, one should expect changes in all of the indicated properties of the metal, and the PEE parameters will be determined by the properties of the adsorbed film. In the studied energy range, when clean faces are bombarded with Ar⁺ ions, the value of γ slightly depends on E, which indicates the potential nature of the emission mechanism. In the case of Ar⁺ ions, a complex dependence γ(E) is observed: up to E = 0.5 keV, γ decreases, and then monotonically increases with increasing E due to the CEE. The influence of the work output of the surface on the indicated parameters of the CEE is most noticeable in the case of monoatomic coating of the surface with adatoms and in the case of bombardment with He⁺ ions. This fact indicates that the main supplier of emitted electrons in submonolayer coatings is the crystalline substrate. Since the values ​​for these two states are close, this fact indicates the same number of excited electrons in the crystalline substrate and in the adsorbate metal films.